Outgas evaluation of cable materials for EUV lithography system

Kazuki Hosoda; Takashi Namikawa; Shinji Yamakawa; Tetsuo Harada; Takeo Watanabe

doi:10.1117/12.3033877

13 November 2024 Outgas evaluation of cable materials for EUV lithography system

Kazuki Hosoda, Takashi Namikawa, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150R (2024) https://doi.org/10.1117/12.3033877
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

Since EUV lithography is performed in a vacuum chamber, hydrocarbon outgassing in the exposure chamber can cause contamination of the optical system in EUV lithography system. Although many studies have been reported on outgassing of resist and masks that are directly irradiated by EUV, there have been few reports discussing outgassing due to EUV irradiation of equipment components that are not directly irradiated but may be exposed to stray light. In this study, we report on the evaluation of outgassing deriving from cable materials in a vacuum and during EUV irradiation.

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Kazuki Hosoda, Takashi Namikawa, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe "Outgas evaluation of cable materials for EUV lithography system", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150R (13 November 2024); https://doi.org/10.1117/12.3033877

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