Diffraction efficiency measurements of two-window-transmission grating for EUV and beyond EUV interference lithography

Rikuya Imai; Shinji Yamakawa; Tetsuo Harada

doi:10.1117/12.3034612

13 November 2024 Diffraction efficiency measurements of two-window-transmission grating for EUV and beyond EUV interference lithography

Rikuya Imai, Shinji Yamakawa, Tetsuo Harada

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Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150U (2024) https://doi.org/10.1117/12.3034612
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

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Abstract

The resolution performance of EUV resist is usuary evaluated by line-space patterning using EB lithography because EUV lithography system is very expensive. However, since the exposure condition of resist is different between EB and EUV, it is also necessary to on pattern the resist using the actual EUV exposure tool. Hence, our group has been constructed EUV Interference Lithography (EUV-IL) tool by two-window-transmission grating at the BL09B beamline at NewSUBARU synchrotron light facility. In addition, beyond EUV (BEUV) with wavelength 6.7nm lithography is expected as next generation of lithography for further miniaturization. In BL09B, the incident wavelength is also covered BEUV for BEUV resist development. The exposure time depends on diffraction efficiency of the diffraction grating. The diffraction efficiency also depends on the grating pattern quality (thickness, ratio, pattern shape), support membrane (thickness, materials), and exposure wavelength (EUV, BEUV). In this study, we report the measurement of diffraction efficiencies of various patterns in EUV and BEUV, and the investigation of compensation for exposure.

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Rikuya Imai, Shinji Yamakawa, and Tetsuo Harada "Diffraction efficiency measurements of two-window-transmission grating for EUV and beyond EUV interference lithography", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150U (13 November 2024); https://doi.org/10.1117/12.3034612

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