Electron blur evaluation for different electron energies

Oleg Kostko; Maximillian Mueller; Patrick Naulleau

doi:10.1117/12.3034739

13 November 2024 Electron blur evaluation for different electron energies

Oleg Kostko, Maximillian Mueller, Patrick Naulleau

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC1321511 (2024) https://doi.org/10.1117/12.3034739
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

The transport of slow electrons is critical in various fields, including extreme ultraviolet (EUV) lithography, where electrons generated after EUV photon absorption can induce chemical reactions, affecting lithographic resolution. Investigating electron transport in EUV-relevant materials is essential for enhancing this resolution. Our presentation discusses the substrate-overlayer technique to measure electron attenuation lengths (EAL) and energy-resolved EAL in the 10 to 90eV range. We found that EAL values range from 0.6 to 2.7nm, with material composition having a greater impact on EAL than electron energy. Our results align well with literature findings, offering insights into low-energy electron behavior and their relationship with the universal curve, aiding the improvement of EUV lithography.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Oleg Kostko, Maximillian Mueller, and Patrick Naulleau "Electron blur evaluation for different electron energies", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC1321511 (13 November 2024); https://doi.org/10.1117/12.3034739

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