Concept and feasibility update on EUV LPOD development

Elson Tu

doi:10.1117/12.3034799

13 November 2024 Concept and feasibility update on EUV LPOD development

Elson Tu

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC1321512 (2024) https://doi.org/10.1117/12.3034799
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

We introduce a larger size of EUV pods, titled as “EUV LPOD,” that will require handling a large and thick photo mask (~153mm x ~305mm) and may include vibration and level sensors.

Citation Download Citation

Elson Tu "Concept and feasibility update on EUV LPOD development", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC1321512 (13 November 2024); https://doi.org/10.1117/12.3034799

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