Manipulating tin ablation for EUV production

Alec Griffith; Anatoli Morozov; Kirill V. Lezhnin; Samuel R. Totorica; Will Fox; Ahmed Diallo

doi:10.1117/12.3037004

13 November 2024 Manipulating tin ablation for EUV production

Alec Griffith, Anatoli Morozov, Kirill V. Lezhnin, Samuel R. Totorica, Will Fox, Ahmed Diallo

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC1321516 (2024) https://doi.org/10.1117/12.3037004
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

Laser-plasma dynamics greatly affect the production of in-band light for lithography in EUV sources. To better tune plasma parameters for efficient EUV production and minimize the production of energetic ions, we explore using modeling in preparation for future experiments to develop and validate higher fidelity predictive capability for EUV sources.

Citation Download Citation

Alec Griffith, Anatoli Morozov, Kirill V. Lezhnin, Samuel R. Totorica, Will Fox, and Ahmed Diallo "Manipulating tin ablation for EUV production", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC1321516 (13 November 2024); https://doi.org/10.1117/12.3037004

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