High-Power Light Source for EUV Lithography Based on the Energy-Recovery Linac Free-Electron Laser

Kawata, Hiroshi, High Energy Accelerator Research Organization, KEK; Kato, Ryukou, High Energy Accelerator Research Organization, KEK; Sakai, Hiroshi, High Energy Accelerator Research Organization, KEK; Nakamura, Norio, High Energy Accelerator Research Organization, KEK; Hajima, Ryoichi, National Institutes for Quantum and Radiological Science and Technology

doi:10.1117/3.2638242.ch25

Book: Photon Sources for Lithography and Metrology

Editor(s): Vivek Bakshi

Author(s): Hiroshi Kawata, Ryukou Kato, Hiroshi Sakai, Norio Nakamura, Ryoichi Hajima

Published: 2023

https://doi.org/10.1117/3.2638242.ch25

Author Affiliations +

Abstract

The following sections of this chapter present the concept of the ERL-FEL light source (Section 25.2), the design and performance of the ERL-FEL source (Section 25.3), the design concept of the optics from the EUV-FEL to the EUV scanner (Section 25.4), efforts to apply the source to industry (Section 25.5), a source that uses wavelengths beyond the EUV (Section 25.6), and a summary and outlook (Section 25.7).