Abstract
Measurement is required for developing lithographic processes and is fundamental to engineering and manufacturing control. The problem of accurate measurement is particularly significant for lithographers, where the extremely small features of state-of-the art processes have pushed measurement capabilities to their limits, and, some might say, beyond. Some of the metrology issues and challenges faced by lithographers are discussed in this chapter.
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KEYWORDS
Scanning electron microscopy

Overlay metrology

Scatterometry

Electron microscopes

Metrology

Semiconducting wafers

Lithography

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