28 January 2016 Phase-induced amplitude apodization complex mask coronagraph mask fabrication, characterization, and modeling for WFIRST-AFTA
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Abstract
This work describes the fabrication, characterization, and modeling of a second-generation occulting mask for a phase-induced amplitude apodization complex mask coronagraph, designed for use on the WFIRST-AFTA mission. The mask has many small features (∼micron lateral scales) and was fabricated at the Jet Propulsion Laboratory Microdevices Laboratory, then characterized using a scanning electron microscope, atomic force microscope, and optical interferometric microscope. The measured fabrication errors were then fed to a wavefront control model which predicts the contrast performance of a full coronagraph. The expected coronagraphic performance using this mask is consistent with observing ∼15 planetary targets with WFIRST-AFTA in a reasonable time (<1  day/target).
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) 2329-4124/2016/$25.00 © 2016 SPIE
Brian Kern, Olivier Guyon, Ruslan Belikov, Daniel Wilson, Richard Muller, Erkin Sidick, Bala Balasubramanian, John Krist, Ilya Poberezhskiy, and Hong Tang "Phase-induced amplitude apodization complex mask coronagraph mask fabrication, characterization, and modeling for WFIRST-AFTA," Journal of Astronomical Telescopes, Instruments, and Systems 2(1), 011014 (28 January 2016). https://doi.org/10.1117/1.JATIS.2.1.011014
Published: 28 January 2016
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CITATIONS
Cited by 11 scholarly publications.
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KEYWORDS
Planets

Coronagraphy

Wavefronts

Apodization

Scanning electron microscopy

Atomic force microscopy

Mask making

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