We reduce the problem of asymmetrical distribution of carriers (electrons and holes) by engineering the last barrier and electron blocking layer (EBL) of green indium gallium nitride (InGaN)-based multiquantum well light-emitting diodes. We employ stair-engineered EBL with a graded InGaN last quantum barrier to enhance the device performance. The efficiency droop ratio of the proposed device is ∼15 % at 100 A / cm2. Similarly, the light output power is also enhanced by about three times, as compared to the reference structure. In addition, a carrier transport issue across the active region is also mitigated in our design.
You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.