You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
30 August 2013Propagation of surface topography of extreme ultraviolet blank substrate through multilayer and impact of phase defect structure on wafer image
Our recent study reveals that the propagation of a phase defect (PD) from an extreme ultraviolet mask substrate surface through a multilayer does not always propagate in a vertical direction. To fully understand the propagation model of PDs, two types of defects on a quartz (Qz) substrate are prepared. One is space patterns fabricated by a mask patterning process followed by an etching giving a cross-sectional angle of 90 deg. The others are atomic force microscopy scratched space patterns with their cross-sectional angles as 30 deg and 60 deg. After coating a patterned Qz substrate with a multilayer, propagation of PDs through the multilayer was observed by a transmit electron microscope (TEM). As a result, the TEM images clearly exhibit a tendency that originates from the Qz substrate while the PDs propagate through the multilayer and their propagation path is inclined toward the center of the mask. The impacts of the inclination angles on the printed images on a wafer are calculated using a simulator. A PD with an inclination angle of 1 deg corresponds to a positional shift of 1 nm on a printed wafer image.
Tsuyoshi Amano andTsuneo Terasawa
"Propagation of surface topography of extreme ultraviolet blank substrate through multilayer and impact of phase defect structure on wafer image," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 033015 (30 August 2013). https://doi.org/10.1117/1.JMM.12.3.033015
The alert did not successfully save. Please try again later.
Tsuyoshi Amano, Tsuneo Terasawa, "Propagation of surface topography of extreme ultraviolet blank substrate through multilayer and impact of phase defect structure on wafer image," J. Micro/Nanolith. MEMS MOEMS 12(3) 033015 (30 August 2013) https://doi.org/10.1117/1.JMM.12.3.033015