27 August 2014 Thermoplastic nanoimprint lithography of electroactive polymer poly(vinylidene fluoride-trifluoroethylene-chlorofluoroethylene) for micro/nanoscale sensors and actuators
Leeya Engel, Slava Krylov, Yosi Shacham-Diamand
Author Affiliations +
Abstract
Thermoplastic nanoimprint lithography has been used for the first time, to the best of our knowledge, as a method for transferring nanoscale patterns to electroactive polymer poly(vinylidene fluoride-trifluoroethylene-chlorofluoroethylene) [P(VDF-TrFE-CFE)]. PVDF, its copolymers, and terpolymers cannot be processed using conventional lithography techniques because of their solubility in most organic solvents and photoresist developers. In this work, line-shaped patterns with widths of 60 to 100 nm were formed in the thermoplastic polymer by thermal compression using a previously patterned and treated silicon (Si) stamp. Annealing of the polymer under compression in a nanoimprinter following imprint resulted in a 10-fold improvement in the surface roughness of the polymer relative to spin-coated layers of P(VDF-TrFE-CFE). Patterning of distinct polymer structures on Si substrates (without residual layer) was achieved for micron scale structures. The processes presented here comprise a basis for the integration of P(VDF-TrFE-CFE) as an active material in nanoscale sensors and actuators.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2014/$25.00 © 2014 SPIE
Leeya Engel, Slava Krylov, and Yosi Shacham-Diamand "Thermoplastic nanoimprint lithography of electroactive polymer poly(vinylidene fluoride-trifluoroethylene-chlorofluoroethylene) for micro/nanoscale sensors and actuators," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033011 (27 August 2014). https://doi.org/10.1117/1.JMM.13.3.033011
Published: 27 August 2014
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CITATIONS
Cited by 10 scholarly publications and 1 patent.
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KEYWORDS
Polymers

Silicon

Nanoimprint lithography

Electroactive polymers

Electron beam lithography

Actuators

Polymer thin films

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