Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Giuseppe Calafiore; Scott Dhuey; Simone Sassolini; Nerea Alayo; David Gosselin; Marko Vogler; Deidre L. Olynick; Christophe Peroz; Stefano Cabrini

doi:10.1117/1.JMM.13.3.033013

5 September 2014 Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre L. Olynick, Christophe Peroz, Stefano Cabrini

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 3, 033013 (September 2014). https://doi.org/10.1117/1.JMM.13.3.033013

Abstract

Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL.

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Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre L. Olynick, Christophe Peroz, and Stefano Cabrini "Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033013 (5 September 2014). https://doi.org/10.1117/1.JMM.13.3.033013

Published: 5 September 2014

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