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16 February 2017 Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating
Ho-Chiao Chuang, Hsi-Min Yang, Cheng-Xiang Wu, Jorge Sanchez, Jenq-Huey Shyu
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 1, 019801 (February 2017). https://doi.org/10.1117/1.JMM.16.1.019801

This article [J. Micro/Nanolith. MEMS MOEMS 16, 014501 (2017)] was originally published with an error in the title.

The term “through-silicon” appeared as “though-silicon.” All online versions of the article were corrected on 06 February 2017. The article appears correctly in print.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
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Ho-Chiao Chuang, Hsi-Min Yang, Cheng-Xiang Wu, Jorge Sanchez, and Jenq-Huey Shyu "Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(1), 019801 (16 February 2017). https://doi.org/10.1117/1.JMM.16.1.019801
Published: 16 February 2017
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KEYWORDS
Electrochemical etching
Electroplating
Mechanical engineering
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