Simulation flow and model verification for laser direct-write lithography

Temitope Onanuga; Maximilian Rumler; Andreas Erdmann

doi:10.1117/1.JMM.16.3.033511

20 September 2017 Simulation flow and model verification for laser direct-write lithography

Temitope Onanuga, Maximilian Rumler, Andreas Erdmann

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 3, 033511 (September 2017). https://doi.org/10.1117/1.JMM.16.3.033511

Abstract

A simulation flow for laser direct-write lithography (LDWL), a maskless lithography process in which a focused laser beam is scanned through a photoresist, is proposed. The simulation flow includes focusing of Gaussian beams, photoresist exposure, free-radical polymerization chemistry of the photoresist, and photoresist development. We applied the simulation method to investigate the scaling of feature sizes or linewidths for a varying number of exposure cycles at a total constant exposure dose. Experimental results from literature demonstrate that exposing the photoresist over multiple exposure cycles causes a reduction in linewidths. We explore possible reasons for this phenomenon and conclude that radical losses occurring between subsequent exposures provide a possible explanation of the observed effects. Furthermore, we apply the developed simulation method to analyze lithographic structures that were fabricated by a combination of LDWL and nanoimprint lithography. The simulation results agree with the experimental tendencies of a reduced likelihood of overexposures with an increase in the number of exposure cycles.

Citation Download Citation

Temitope Onanuga, Maximilian Rumler, and Andreas Erdmann "Simulation flow and model verification for laser direct-write lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 033511 (20 September 2017). https://doi.org/10.1117/1.JMM.16.3.033511

Received: 21 June 2017; Accepted: 23 August 2017; Published: 20 September 2017

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available