Effects of reticle reflectance on lithography

Kevin D. Cummings; Bernd Geh; Bing Lu; James R. Wasson; Pawitter J.S. Mangat

doi:10.1117/1.1668268

1 April 2004 Effects of reticle reflectance on lithography

Kevin D. Cummings, Bernd Geh, Bing Lu, James R. Wasson, Pawitter J.S. Mangat

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 3, Issue 2, (April 2004). https://doi.org/10.1117/1.1668268

Abstract

We report in this work both experimental and theoretical results showing the effects of reticle absorber reflectivity on standard flare measurements, image formation, and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system and therefore should not limit lithography.

©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Kevin D. Cummings, Bernd Geh, Bing Lu, James R. Wasson, and Pawitter J.S. Mangat "Effects of reticle reflectance on lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(2), (1 April 2004). https://doi.org/10.1117/1.1668268

Published: 1 April 2004

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