Fabrication of silicon microring resonators with narrow coupling gaps

Binglin Miao; Peng Yao; Janusz A. Murakowski; Dennis W. Prather

doi:10.1117/1.1898605

1 April 2005 Fabrication of silicon microring resonators with narrow coupling gaps

Binglin Miao, Peng Yao, Janusz A. Murakowski, Dennis W. Prather

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 4, Issue 2, 023013 (April 2005). https://doi.org/10.1117/1.1898605

Abstract

We demonstrate fabrication of silicon microring resonators with narrow coupling gaps using electron-beam lithography followed by lift-off process. Microring resonators of different diameters and 58 nm coupling gaps are fabricated in a silicon-on-insulator water. These devices are then characterized using a tunable laser source. For the microring resonator with a diameter of 7.5 µm, the measured maximum transmission is 88%, the free spectra range is 25 nm, the finesse is 28, and the Q factor is 1715.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Binglin Miao, Peng Yao, Janusz A. Murakowski, and Dennis W. Prather "Fabrication of silicon microring resonators with narrow coupling gaps," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(2), 023013 (1 April 2005). https://doi.org/10.1117/1.1898605

Published: 1 April 2005

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