Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering

Ronald L. Jones; Christopher L. Soles; Eric K. Lin; Wenchuang Hu; Ronald M. Reano; Stella W. Pang; Steven J. Weigand; Denis T. Keane; John P. Quintana

doi:10.1117/1.2170550

1 January 2006 Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering

Ronald L. Jones, Christopher L. Soles, Eric K. Lin, Wenchuang Hu, Ronald M. Reano, Stella W. Pang, Steven J. Weigand, Denis T. Keane, John P. Quintana

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 5, Issue 1, 013001 (January 2006). https://doi.org/10.1117/1.2170550

Abstract

The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. Routine production of nanoscale patterns will require new metrologies capable of nondestructive dimensional measurements of both the mold and the pattern with subnanometer precision. In this work, a rapid, nondestructive technique termed critical dimension small angle x-ray scattering (CD-SAXS) is used to measure the cross sectional shape of both a pattern master, or mold, and the resulting imprinted films. CD-SAXS data are used to extract periodicity as well as pattern height, width, and sidewall angles. Films of varying materials are molded by thermal embossed NIL at temperatures both near and far from the bulk glass transition (T_G). The polymer systems include a photoresist and two homopolymers. Our results indicate that molding at low temperatures (T-T_G<40°C) produces small-aspect-ratio patterns that maintain periodicity to within a single nanometer, but feature large sidewall angles. While the observed pattern height does not reach that of the mold until very large imprinting temperatures (T-T_G≈70°C), the pattern width of the mold is accurately transferred for T-T_G>30°C.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Ronald L. Jones, Christopher L. Soles, Eric K. Lin, Wenchuang Hu, Ronald M. Reano, Stella W. Pang, Steven J. Weigand, Denis T. Keane, and John P. Quintana "Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(1), 013001 (1 January 2006). https://doi.org/10.1117/1.2170550

Published: 1 January 2006

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available