Free-standing C60 nanowire fabricated using XeF2 sacrificial dry etching

Toshiyuki Tsuchiya; Yasutake Ura; Yomoya Jomori; Koji Sugano; Osamu Tabata

doi:10.1117/1.3094745

1 January 2009 Free-standing C₆₀ nanowire fabricated using XeF₂ sacrificial dry etching

Toshiyuki Tsuchiya, Yasutake Ura, Yomoya Jomori, Koji Sugano, Osamu Tabata

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 1, 013020 (January 2009). https://doi.org/10.1117/1.3094745

Abstract

We report a fabrication of doubly supported free-standing buckminsterfullerene (C₆₀) nanowires onto single crystal silicon microstructures in order to demonstrate an integration of carbon nanomaterials to surface-micromachined microelectromechanical devices. By irradiating vacuum-deposited C₆₀ film with an electron beam, polymerized C₆₀ nanowires were patterned. Free-standing structures of the C₆₀ nanowires were obtained by sacrificial etching of underlying silicon structures using XeF₂ gas. The supporting 5-µm thick silicon structure was released using vapor hydrofluoric acid. The C₆₀ nanowire of 2-µm width, 25-µm length, and 40-nm thickness connected to a movable single crystal silicon structure was successfully fabricated.

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Toshiyuki Tsuchiya, Yasutake Ura, Yomoya Jomori, Koji Sugano, and Osamu Tabata "Free-standing C₆₀ nanowire fabricated using XeF₂ sacrificial dry etching," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(1), 013020 (1 January 2009). https://doi.org/10.1117/1.3094745

Published: 1 January 2009

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