Making double patterning cost single

Burn J. Lin

doi:10.1117/1.3098441

1 January 2009 Making double patterning cost single

Burn J. Lin

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, Issue 1, 010101 (January 2009). https://doi.org/10.1117/1.3098441

This PDF file contains the editorial “Making double patterning cost single” for JM3 Vol. 8 Issue 01

©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Burn J. Lin "Making double patterning cost single," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(1), 010101 (1 January 2009). https://doi.org/10.1117/1.3098441

Published: 1 January 2009

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KEYWORDS

Double patterning technology

Photomasks

Optical lithography

Scanners

3D scanning

Beam splitters

Laser scanners

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