Characterization of dry etching of TiO2/SiO2 distributed Bragg reflectors for tunable optical sensor arrays

Onny Setyawati; Markus Engenhorst; Martin Bartels; Vadim Daneker; Stefan Wittzack; Tatjana Woit; Florestan Köhler; Harmut H. Hillmer

doi:10.1117/1.3524828

1 October 2010 Characterization of dry etching of TiO₂/SiO₂ distributed Bragg reflectors for tunable optical sensor arrays

Onny Setyawati, Markus Engenhorst, Martin Bartels, Vadim Daneker, Stefan Wittzack, Tatjana Woit, Florestan Köhler, Harmut H. Hillmer

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 4, 041110 (October 2010). https://doi.org/10.1117/1.3524828

Abstract

We present the characterization of a dry-etching process for high-contrast TiO₂/SiO₂ distributed Bragg reflectors, by inductively coupled plasma reactive ion etching, focusing on the etch rate and the etch selectivity. Photoresists and metals as etch masks were investigated. An excellent etch profile using an indium tin oxide mask was obtained, with an etch rate of >80 nm/min at a pressure of 6 mTorr. The experiments were developed for structuring Fabry-Pérot filters for tunable optical sensor arrays.

©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Onny Setyawati, Markus Engenhorst, Martin Bartels, Vadim Daneker, Stefan Wittzack, Tatjana Woit, Florestan Köhler, and Harmut H. Hillmer "Characterization of dry etching of TiO₂/SiO₂ distributed Bragg reflectors for tunable optical sensor arrays," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(4), 041110 (1 October 2010). https://doi.org/10.1117/1.3524828

Published: 1 October 2010

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