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1 January 2010 Can MEMS Take Advantage of Advances in Semiconductor Lithography?
Burn J. Lin
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 1, 010101 (January 2010). https://doi.org/10.1117/1.3372719
This PDF file contains the editorial “Editorial: Can MEMS Take Advantage of Advances in Semiconductor Lithography?” for JM3 Vol. 9 Issue 01
©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)
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Burn J. Lin "Can MEMS Take Advantage of Advances in Semiconductor Lithography?," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(1), 010101 (1 January 2010). https://doi.org/10.1117/1.3372719
Published: 1 January 2010
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Cited by 2 scholarly publications.
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KEYWORDS
Semiconductors
Microelectromechanical systems
Lithography
Printing
Nanoelectromechanical systems
Optical lithography
Electron beam lithography
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