Journal of Micro/Nanolithography, MEMS, and MOEMS

Harry Levinson, HJL Lithography, USA
Hans Zappe, University of Freiburg, Germany

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM 3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.

On the cover: The figure is from the paper " Cascade and cluster of correlated reactions as causes of stochastic defects in exrtreme ultraviolet lithography" by Hiroshi Fukuda, from Vol. 19, Issue 2.

Featured Content

Construction of complex logic circuit based on nanoparticles

Zhao Chen et al.

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

J. Church et al.

Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations

Jonathan H. Ma et al.

Most Viewed

from the Journal of Micro/Nanolithography, MEMS, and MOEMS

High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features

Wei Sun, Hiroya Ohta, Taku Ninomiya, Yasunori Goto (2020) Open Access

Overlay error statistics for multiple-exposure patterning

Allen H. Gabor, Nelson M. Felix (2019) Open Access

Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition

Jiyeah Rhie, et al. (2018) Open Access

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer (2018) Open Access

Retrospective on VLSI value scaling and lithography

Michael L. Rieger (2019) Open Access

Review of scanning electron microscope-based overlay measurement beyond 3-nm node device

Osamu Inoue, Kazuhisa Hasumi (2019) Open Access

Electrostatically tunable MOEMS waveguide Bragg grating-based DWDM optical filter

Poorna Lakshmi Uppalapati, Balasubramanian Malayappan, Narayan Krishnaswamy, Prasant Kumar Pattnaik (2019) Open Access

Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes

Gavin C. Rider (2018) Open Access

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018) Open Access

Contact inspection and resistance–capacitance measurement of Si nanowire with SEM voltage contrast

Takeyoshi Ohashi, Kazuhisa Hasumi, Masami Ikota, Gian Francesco Lorusso, Hans Mertens, Naoto Horiguchi (2019) Open Access

Author benefits:

  • Rigorous and prompt peer review
  • Rapid, e-first publication of articles
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform


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