Journal of Micro/Nanopatterning, Materials, and Metrology
VOL. 24 · NO. 1 | January 2025
ISSUES IN PROGRESS
IN PROGRESS
SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.
Special Section on High Numerical Aperture Exposure Tools and Lithography
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011002, (October 2024) https://doi.org/10.1117/1.JMM.24.1.011002
Open Access
TOPICS: Photomasks, Light sources and illumination, Surface plasmons, Semiconducting wafers, Resolution enhancement technologies, Source mask optimization, Nanoimprint lithography, Near field, Diffraction, Lithography
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011003, (October 2024) https://doi.org/10.1117/1.JMM.24.1.011003
TOPICS: Polarization, Reticles, Semiconducting wafers, Light sources and illumination, Interpolation, Computation time, Diffraction, Vibration, Matrices, Device simulation
Jodi Grzeskowiak, Michael Murphy, David Power, Steven Grzeskowiak, Jacob Dobson, Andrew Weloth, Charlotte Cutler, Eric Liu, David Conklin, Anton Devilliers
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011004, (November 2024) https://doi.org/10.1117/1.JMM.24.1.011004
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011005, (October 2024) https://doi.org/10.1117/1.JMM.24.1.011005
Open Access
TOPICS: Extreme ultraviolet lithography, Photons, Extreme ultraviolet, Optical lithography, Electrons, Gas lasers, Free electron lasers, Light absorption, Light sources, Phase shifts
Ted Liang, Hiroki Miyai, Safak Sayan, Michiteru Mizoguchi, Ko Gondaira, Masayasu Nishizawa, Tomohiro Suzuki, Toshiyuki Todoroki, Yuwei Li, Frank Abboud
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011006, (October 2024) https://doi.org/10.1117/1.JMM.24.1.011006
TOPICS: Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Light sources, Defect detection, Signal to noise ratio, Tin, Printing, Light sources and illumination
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011007, (November 2024) https://doi.org/10.1117/1.JMM.24.1.011007
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011008, (November 2024) https://doi.org/10.1117/1.JMM.24.1.011008
Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 24, Issue 01, 011009, (December 2024) https://doi.org/10.1117/1.JMM.24.1.011009
TOPICS: Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Mirrors, Sensors, Light sources and illumination, Design, Imaging systems, Extreme ultraviolet lithography
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