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2 December 2013 Impact of realistic source shape and flexibility on source mask optimization
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Abstract
Source mask optimization (SMO) is widely used to make state-of-the-art semiconductor devices in high-volume manufacturing. To realize mature SMO solutions in production, the Intelligent Illuminator, which is an illumination system on a Nikon scanner, is useful because it can provide generation of freeform sources with high fidelity to the target. Proteus SMO, which employs co-optimization method and an insertion of validation with mask three-dimensional effect and resist properties for an accurate prediction of wafer printing, can take into account the properties of Intelligent Illuminator. We investigate an impact of the source properties on the SMO to pattern of a static random access memory. Quality of a source made on the scanner compared to the SMO target is evaluated with in-situ measurement and aerial image simulation using its measurement data. Furthermore, we discuss an evaluation of a universality of the source to use it in multiple scanners with a validation and with estimated value of scanner errors.
Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui, Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, and Tomoyuki Matsuyama "Impact of realistic source shape and flexibility on source mask optimization," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(1), 011005 (2 December 2013). https://doi.org/10.1117/1.JMM.13.1.011005
Published: 2 December 2013
JOURNAL ARTICLE
10 PAGES


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