Measuring multielectron beam imaging fidelity with a signal-to-noise ratio analysis

Maseeh Mukhtar; Benjamin D. Bunday; Kathy Quoi; Matt Malloy; Brad Thiel

doi:10.1117/1.JMM.15.3.034004

23 August 2016 Measuring multielectron beam imaging fidelity with a signal-to-noise ratio analysis

Maseeh Mukhtar, Benjamin D. Bunday, Kathy Quoi, Matt Malloy, Brad Thiel

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 3, 034004 (August 2016). https://doi.org/10.1117/1.JMM.15.3.034004

Abstract

Java Monte Carlo Simulator for Secondary Electrons (JMONSEL) simulations are used to generate expected imaging responses of chosen test cases of patterns and defects with the ability to vary parameters for beam energy, spot size, pixel size, and/or defect material and form factor. The patterns are representative of the design rules for an aggressively scaled FinFET-type design. With these simulated images and resulting shot noise, a signal-to-noise framework is developed, which relates to defect detection probabilities. Additionally, with this infrastructure, the effect of detection chain noise and frequency-dependent system response can be made, allowing for targeting of best recipe parameters for multielectron beam inspection validation experiments. Ultimately, these results should lead to insights into how such parameters will impact tool design, including necessary doses for defect detection and estimations of scanning speeds for achieving high throughput for high-volume manufacturing.

Citation Download Citation

Maseeh Mukhtar, Benjamin D. Bunday, Kathy Quoi, Matt Malloy, and Brad Thiel "Measuring multielectron beam imaging fidelity with a signal-to-noise ratio analysis," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 034004 (23 August 2016). https://doi.org/10.1117/1.JMM.15.3.034004

Published: 23 August 2016

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