First-row transitional-metal oxalate resists for EUV

Miles Wilklow-Marnell; David Moglia; Benjamin Steimle; Brian Cardineau; Hashim Al-Mashat; Peter Nastasi; Kara Heard; Amber Aslam; Rachel Kaminski; Michael Murphy; Ryan Del Re; Miriam Sortland; Michaela Vockenhuber; Yasin Ekinci; Robert L. Brainard; Daniel A. Freedman

doi:10.1117/1.JMM.17.4.043507

19 December 2018 First-row transitional-metal oxalate resists for EUV

Miles Wilklow-Marnell, David Moglia, Benjamin Steimle, Brian Cardineau, Hashim Al-Mashat, Peter Nastasi, Kara Heard, Amber Aslam, Rachel Kaminski, Michael Murphy, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber , Yasin Ekinci, Robert L. Brainard, Daniel A. Freedman

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 17, Issue 4, 043507 (December 2018). https://doi.org/10.1117/1.JMM.17.4.043507

Abstract

We have developed inorganic oxalate compounds [PPh₃(CH₂Ph)][M(2,2′-bipyridine)_n(oxalate)_(3-n)] (n=1, 2, 3; M = Co, Fe, Cr) capable of acting as negative-tone extreme ultraviolet (EUV) resists. Two important trends are observed: (1) sensitivity increases with the number of oxalate ligands; (2) Cobalt and iron complexes exhibit greater sensitivity than analogous chromium complexes. Lithographic studies of the most successful compound, [PPh₃(CH₂Ph)][Co(2,2′-bipyridine)(oxalate)₂], show that it can consistently achieve 20 nm h/p lines at doses approaching 30 mJ/cm₂. Infrared, paramagnetic nuclear magnetic resonance, and cyclic voltammetric studies of this compound show that the reaction products of the EUV photochemistry are Co(II)(2,2′-bipyridine)(oxalate) and [PPh₃(CH₂Ph)]₂(oxalate) formed from the decomposition of one of the oxalate ligands into two equivalents each of carbon dioxide and electrons.

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Miles Wilklow-Marnell, David Moglia, Benjamin Steimle, Brian Cardineau, Hashim Al-Mashat, Peter Nastasi, Kara Heard, Amber Aslam, Rachel Kaminski, Michael Murphy, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber , Yasin Ekinci, Robert L. Brainard, and Daniel A. Freedman "First-row transitional-metal oxalate resists for EUV," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(4), 043507 (19 December 2018). https://doi.org/10.1117/1.JMM.17.4.043507

Received: 7 September 2018; Accepted: 16 November 2018; Published: 19 December 2018

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