CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness

Daisuke Bizen; Shunsuke Mizutani; Makoto Sakakibara; Makoto Suzuki; Yoshinori Momonoi

doi:10.1117/1.JMM.18.3.034004

18 September 2019 CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness

Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, Yoshinori Momonoi

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 3, 034004 (September 2019). https://doi.org/10.1117/1.JMM.18.3.034004

No abstract for this paper is available.

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Daisuke Bizen, Shunsuke Mizutani, Makoto Sakakibara, Makoto Suzuki, and Yoshinori Momonoi "CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness," Journal of Micro/Nanolithography, MEMS, and MOEMS 18(3), 034004 (18 September 2019). https://doi.org/10.1117/1.JMM.18.3.034004

Received: 10 July 2019; Accepted: 29 August 2019; Published: 18 September 2019

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