Electron beam mastering process realized over a 100-GB/layer capacity disk

Minoru Takeda; Motohiro Furuki; Masanobu Yamamoto; Masataka Shinoda; Kimihiro Saito; Yuichi Aki; Hiroshi Kawase; Mitsuru Koizumi; Toshiaki Miyokawa; Masao Mutou

doi:10.1117/1.1793154

1 October 2004 Electron beam mastering process realized over a 100-GB/layer capacity disk

Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, Masao Mutou

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 3, Issue 4, (October 2004). https://doi.org/10.1117/1.1793154

Abstract

We demonstrate the capability of 100-GB density recording by electron beam mastering and readout by a near-field optical pickup with an effective NA of 2.05 and a blue LD of 405-nm wavelength. A silicon (Si) disk of 100-GB density is fabricated by an optimized Si etching process condition to form suitable pit pattern shapes for the near-field readout.

©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito, Yuichi Aki, Hiroshi Kawase, Mitsuru Koizumi, Toshiaki Miyokawa, and Masao Mutou "Electron beam mastering process realized over a 100-GB/layer capacity disk," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(4), (1 October 2004). https://doi.org/10.1117/1.1793154

Published: 1 October 2004

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