The Journal of Micro/Nanopatterning, Materials, and Metrology (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Formerly the Journal of Micro/Nanolithography, MEMS, and MOEMS, the journal’s key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. In this context the electronics industry includes but is not limited to integrated circuits and multichip modules, and advanced packaging with features in the submicron regime.
On the cover: The figure is from the paper "Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures" by Joost Bekaert et al. from the Special Series on EUV Masks in Vol. 20, Issue 2.