Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications

Marco I. Buraschi; Laura Bacci; Giorgio De Santi

doi:10.1117/12.7977016

1 June 1989 Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications

Marco I. Buraschi, Laura Bacci, Giorgio De Santi

Author Affiliations +

Optical Engineering, Vol. 28, Issue 6, 286654 (June 1989). https://doi.org/10.1117/12.7977016

Abstract

A novel method for obtaining a tapered profile in photoresist is proposed. On the mask near the main features we add some slits smaller than the resolution limit of the projection optics at a distance also smaller than the resolution limit. In such a way, a controlled sloped profile can be obtained. We have applied this method to open tapered contacts and vias (contacts between two levels of metal) without using the thermal reflow technique of borophos-phosilicate glass, optimizing the configuration of the subresolved slits by means of a simplified mathematical model. There is experimental evidence that contacts can still be opened up to the diffraction limit of the projection optics.

Citation Download Citation

Marco I. Buraschi, Laura Bacci, and Giorgio De Santi "Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications," Optical Engineering 28(6), 286654 (1 June 1989). https://doi.org/10.1117/12.7977016

Published: 1 June 1989

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available