Holograms For Optical Interconnects For Very Large Scale Integrated Circuits Fabricated By Electron-Beam Lithography

Michael R. Feldman; Clark C. Guest

doi:10.1117/12.7977056

1 August 1989 Holograms For Optical Interconnects For Very Large Scale Integrated Circuits Fabricated By Electron-Beam Lithography

Michael R. Feldman, Clark C. Guest

Author Affiliations +

Optical Engineering, Vol. 28, Issue 8, 288915 (August 1989). https://doi.org/10.1117/12.7977056

Abstract

High performance holograms are a crucial part of realizing the predicted benefits of optical interconnection of electronic circuits. Fabrication of computer-generated holograms using electron-beam lithography provides access to the needed performance but presents new challenges in design, encoding, and data handling. Two holograms are described that represent different approaches in each of these areas. The first hologram connects a single laser source to several widely separated detectors. A paraxial imaging arrangement allows the holographic interferogram to be encoded as concentric circles of a Fresnel zone plate. The second hologram was designed to replace the row address lines on a 1 kbit RAM chip. In this case, broad separation of the sources prohibits use of the paraxial approximation. Instead, a piecewise approximation to the optimal phase function is encoded with a closed-contour fringe-tracing algorithm. Both holograms were evaluated in experimental systems involving photodetectors integrated onto a VLSI circuit chip and a discrete semiconductor laser.

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Michael R. Feldman and Clark C. Guest "Holograms For Optical Interconnects For Very Large Scale Integrated Circuits Fabricated By Electron-Beam Lithography," Optical Engineering 28(8), 288915 (1 August 1989). https://doi.org/10.1117/12.7977056

Published: 1 August 1989

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