1 June 1990 Semitransparent soft x-ray multilayer mirrors
Chantal G. Khan Malek, Jean Susini, A. Madouri, M. Ouahabi, Jean-Rene Rivoira, F. R. Ladan, Yves Lepetre, Robert J. Barchewitz
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Abstract
We report on the conception, fabrication, and characterization of a multilayer beamsplitter for use at oblique incidence in the soft x-ray range. Thin film deposition, conventional patterning, and anisotropic etch techniques are used to produce the self-supporting silicon carbide carrier film. Large-area Mo/C multilayer beamsplitters (1 cm2 ) were fabricated. Experimental results on the reflection and transmission at 1.33 nm are presented and compared with theoretical calculations. The role of the supporting film and the flatness of the structure are addressed. Our process is compared with existing approaches from the literature.
Chantal G. Khan Malek, Jean Susini, A. Madouri, M. Ouahabi, Jean-Rene Rivoira, F. R. Ladan, Yves Lepetre, and Robert J. Barchewitz "Semitransparent soft x-ray multilayer mirrors," Optical Engineering 29(6), (1 June 1990). https://doi.org/10.1117/12.55634
Published: 1 June 1990
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CITATIONS
Cited by 11 scholarly publications and 1 patent.
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KEYWORDS
Multilayers

X-rays

Mirrors

Beam splitters

Anisotropic etching

Etching

Optical lithography

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