Design and development of a rotating wafer scanner

Stavros Kalafatis; John F. O'Hanlon; Kenneth P. Gross

doi:10.1117/12.60850

1 February 1993 Design and development of a rotating wafer scanner

Stavros Kalafatis, John F. O'Hanlon, Kenneth P. Gross

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Optical Engineering, Vol. 32, Issue 2, (February 1993). https://doi.org/10.1117/12.60850

Abstract

A rotating wafer scanner is designed and developed to determine its operational feasibility and advantages over a linear wafer scanner. The scanner is designed to operate at atmosphere. Each of its constituent parts were independently tested, and when the assembled system was evaluated, 0.2-μm-diam particle detectivity was observed.

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Stavros Kalafatis, John F. O'Hanlon, and Kenneth P. Gross "Design and development of a rotating wafer scanner," Optical Engineering 32(2), (1 February 1993). https://doi.org/10.1117/12.60850

Published: 1 February 1993

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