Projection x-ray lithography with ultrathin imaging layers and selective electroless metallization

Mordechai Rothschild; Jan H. C. Sedlacek

doi:10.1117/12.146857

1 October 1993 Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. C. Sedlacek

Author Affiliations +

Optical Engineering, Vol. 32, Issue 10, (October 1993). https://doi.org/10.1117/12.146857

Abstract

The effect of 193-nm excimer laser radiation on pellicles designed for 248-nm use is studied. The pellicles are transparent at 193 nm as well. However, prolonged irradiation causes gradual thinning and eventual rupture of the pellicle. The rate of change depends on the fluence and on the total dose but is not affected by the presence of atmospheric oxygen. Two-photon absorption plays an important role in the interaction between the laser and the pellicle material. Extrapolation to the approximately 0.1 mJ cm²/pulse fluences expected to be used in 193-nm steppers indicates that these pellicles will change little for several years in a full-production environment.

Citation Download Citation

Mordechai Rothschild and Jan H. C. Sedlacek "Laser-induced damage in pellicles at 193 nm," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.146857

Published: 1 October 1993

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