High-reflectivity patterned metal mirror used in an optically addressed spatial light modulator

Qihong Wu; Stephen H. Perlmutter; Robert A. Rice; Garret Moddel

doi:10.1117/12.160965

1 March 1994 High-reflectivity patterned metal mirror used in an optically addressed spatial light modulator

Qihong Wu, Stephen H. Perlmutter, Robert A. Rice, Garret Moddel

Author Affiliations +

Optical Engineering, Vol. 33, Issue 3, (March 1994). https://doi.org/10.1117/12.160965

Abstract

We demonstrate an a-Si:H/su rface-stabilized ferroelectric liquid crystal (FLC) optically addressed spatial light modulator (SSFLC OASLM) incorporating a reflecting patterned metal mirror. The mirror, made using standard photolithographic techniques, has a three-layer structure containing two metal-matrix layers with an insulating layer between. Compared to a single metal-matrix layer, the gaps between the edges of pixels can be greatly reduced. With two metal-matrix layers, the principle advantages of a metal mirror over a dielectric stack reflector in FLC OASLMs are the metal layer's high capacitance and relatively achromatic reflectivity. A consequence of the metal-matrix pattern is that the effective reflectivity of the mirror is a function of the f/# of the read-beam-imaging optics. With f = 1/6, the theoretical maximum effective reflectivity is 0.91 R_metal where R_metal is the reflectivity of the metal. Our device has measured reflectivities as high as 0.52. The transmission coefficient of the mirror is measured to be as low as 0.017.

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Qihong Wu, Stephen H. Perlmutter, Robert A. Rice, and Garret Moddel "High-reflectivity patterned metal mirror used in an optically addressed spatial light modulator," Optical Engineering 33(3), (1 March 1994). https://doi.org/10.1117/12.160965

Published: 1 March 1994

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