Infrared reflection polarizers using uniform and Gaussian low-index layers buried in high-index substrates

Rasheed M. A. Azzam; Mostofa M. K. Howlader

doi:10.1117/1.601162

1 January 1997 Infrared reflection polarizers using uniform and Gaussian low-index layers buried in high-index substrates

Rasheed M. A. Azzam, Mostofa M. K. Howlader

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Optical Engineering, Vol. 36, Issue 1, (January 1997). https://doi.org/10.1117/1.601162

The extinction ratio (ER) and the throughput or reflectance for the unextinguished s polarization (Rs ) are calculated for infrared reflection polarizers that consist of a low-index transparent layer embedded in a high-index transparent substrate. The dependence of ER and Rs on the depth and width of the buried layer is illustrated by iso-ER and iso-Rs contours for a specific SiO2-in-Si IR reflection polarizer that operates at 3.5-?m wavelength and 80-deg angle of incidence. The two cases of a uniform layer with sharp boundaries and a diffuse Gaussian layer are considered. The diffuse-layer model employs Bruggeman’s effectivemedium theory and is intended to simulate devices that are fabricated by the oxygen-ion implantation of Si. The effect of an outermost oxide film and the angular and wavelength sensitivities of these polarizers are determined.

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Rasheed M. A. Azzam and Mostofa M. K. Howlader "Infrared reflection polarizers using uniform and Gaussian low-index layers buried in high-index substrates," Optical Engineering 36(1), (1 January 1997). https://doi.org/10.1117/1.601162

Published: 1 January 1997

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