1 March 2000 Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function
Jinglei Du, Fuhua Gao, Yongkang Guo, Chunlei Du, Chuankai Qiu, Zheng Cui
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By applying energy conservation to the effect of a laser beam on a resist, a modified proximity function is proposed. The measured data on energy absorption in a photoresist are fitted well with the modified function. By using the new model, an effective precompensation method can be used to correct proximity effects in laser direct writing. Experimental results have been obtained on a laser direct writing machine with line width of 0.6 ?m.
Jinglei Du, Fuhua Gao, Yongkang Guo, Chunlei Du, Chuankai Qiu, and Zheng Cui "Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function," Optical Engineering 39(3), (1 March 2000). https://doi.org/10.1117/1.602426
Published: 1 March 2000
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Cited by 3 scholarly publications.
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KEYWORDS
Photoresist materials

Distortion

Lithography

Optical proximity correction

Laser scattering

Optical simulations

Scattering

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