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1 November 2004 Blazed binary diffractive gratings with antireflection coating for improved operation at 10.6 μm
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Abstract
We report on the design fabrication and characterization a 3-λperiod grating composed of subwavelength ridges of progressively varying widths for operation at 10.6 μm. The grating is blazed into the first transmitted order (an efficiency of 80% is measured) under TM polarization and over a broad range of angles of incidence. The fabrication involves contact photolithography, reactive-ion etching, and an evaporation deposition over the etched structure. The result validates the use of photolithography, a low-cost technology, for the manufacture of efficient blazed binary diffractive elements for thermal imaging (the 8- to 12-μm IR band).
©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)
Mane-Si Laure Lee, Pierre Legagneux, Philippe Lalanne, Jean-Claude Rodier, Patrick Gallais, Chantal Germain, and Joël Rollin "Blazed binary diffractive gratings with antireflection coating for improved operation at 10.6 μm," Optical Engineering 43(11), (1 November 2004). https://doi.org/10.1117/1.1802253
Published: 1 November 2004
JOURNAL ARTICLE
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