Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth

Carsten Glasenapp; Hans Zappe

doi:10.1117/1.2870103

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1 February 2008 Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth

Carsten Glasenapp, Hans Zappe

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Optical Engineering, 47(2), 023002 (2008). https://doi.org/10.1117/1.2870103

Abstract

A new approach for the fabrication of continuous-relief diffractive phase patterns is presented. The approach is based on a maskless lithography system with reflective liquid crystal displays that is able to expose continuous and binary reliefs in photoresist with a resolution of 3.4 μm. Due to a spatial frequency analysis of the entire exposure system, a compensation transformation may be applied to the input data, which results in constant structure depths independent of spatial frequencies.

©(2008) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Carsten Glasenapp and Hans Zappe "Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth," Optical Engineering 47(2), 023002 (1 February 2008). https://doi.org/10.1117/1.2870103

Published: 1 February 2008

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