1 July 2009 Fabrication of three-dimensional photonic crystals using autocloning layers on the self-assembled microspheres
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Abstract
A novel technique was proposed to fabricate a three-dimensional photonic crystal by self-assembling microspheres and the autocloning technology. The autocloning thin-film layers were superimposed on the prepared two-dimensional structural substrates using self-assembled microspheres. The thin-film process allows the three-dimensional periodic structure to be easily modified in the thickness dimension to structure as needed. We analyzed the etching effect using the unified process model according to the surface movement and surface velocity of the film to achieve the surface profile of the SiO2 adjusting layer. Finally, 17 layers of Ta2O5/SiO2 multilayers were stacked on the SiO2 adjusting layer successfully.
©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)
Te-Hung Chang, Sheng-Hui Chen, Chia-Hua Chan, Yu-Wen Yeh, Shih-Liang Ku, Cheng-Chung Lee, Chii-Chang Chen, and Chao-Chun Huang "Fabrication of three-dimensional photonic crystals using autocloning layers on the self-assembled microspheres," Optical Engineering 48(7), 073401 (1 July 2009). https://doi.org/10.1117/1.3183906
Published: 1 July 2009
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Etching

Thin films

Multilayers

Photonic crystals

Ions

Thin film deposition

Molecular self-assembly

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