On-the-fly writing of a long grating phase mask

Philipp Muller; Yves Jourlin; Colette Veillas; Gerard Bernaud; Yannick Bourgin; Svetlen H. Tonchev; Olivier Dellea

doi:10.1117/1.3549254

1 March 2011 On-the-fly writing of a long grating phase mask

Philipp Muller, Yves Jourlin, Colette Veillas, Gerard Bernaud, Yannick Bourgin, Svetlen H. Tonchev, Olivier Dellea

Author Affiliations +

Optical Engineering, Vol. 50, Issue 3, 038001 (March 2011). https://doi.org/10.1117/1.3549254

Abstract

A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wave transverse-electric-polarized collimated laser beam under the −1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Philipp Muller, Yves Jourlin, Colette Veillas, Gerard Bernaud, Yannick Bourgin, Svetlen H. Tonchev, and Olivier Dellea "On-the-fly writing of a long grating phase mask," Optical Engineering 50(3), 038001 (1 March 2011). https://doi.org/10.1117/1.3549254

Published: 1 March 2011

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