1 May 2011 Microelectromechanical systems surface characterization based on white light phase shifting interferometry
Tong Guo, Long Ma, Jinping Chen, Xing Fu, Xiaotang Hu
Author Affiliations +
Abstract
This paper describes a new peak detecting algorithm combined Carré phase shifting interferometry with white light interferometry. The new method can carry the fast, accurate, and noncontact measurements. The testing system employs a Mirau objective on a piezoelectric transducer based on a Zeiss microscope. Several numerical simulations are first carried to analyze its phase calculation errors due to the visibility variation in the white light correlogram. Afterwards, the centroid method is adopted to concentrate the phase extraction on the zero-order fringe, which not only decreases the phase error, but also frees the data processing from the phase unwrapping procedure. The capabilities of the system and the proposed algorithm are evaluated through the measurements of a microresonator and two standard step heights. In the measurement of the 44-nm standard step height, no overshoot shows up on or close to the edge of the sample. At last, three different methods include: white light phase shifting interferometry, phase shifting interferometry and white light interferometry are employed to make a comparison on the measurement precision.
©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)
Tong Guo, Long Ma, Jinping Chen, Xing Fu, and Xiaotang Hu "Microelectromechanical systems surface characterization based on white light phase shifting interferometry," Optical Engineering 50(5), 053606 (1 May 2011). https://doi.org/10.1117/1.3577694
Published: 1 May 2011
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CITATIONS
Cited by 14 scholarly publications.
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KEYWORDS
Phase interferometry

Computer simulations

Microelectromechanical systems

3D imaging standards

3D metrology

Optical interferometry

Microresonators

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