11 August 2014 Accelerated lifetime testing of fused silica for deep ultraviolet laser applications revised
Christian Mühlig, Simon Bublitz
Author Affiliations +
Abstract
We report on the continuation of a comparative study of different fused silica materials for ArF laser applications. After selecting potentially suited fused silica materials from their laser-induced absorption and compaction obtained by a short-time testing procedure, accelerated lifetime tests have been undertaken by sample irradiating at liquid nitrogen temperature and subsequent direct absorption measurements were made using the laser-induced deflection technique. The obtained degradation acceleration strongly differs between fused silica materials, showing high and low oxygen hole (OH) contents, respectively. As a result, a difference in the absorption degradation mechanism between high and low OH-containing fused silica is proposed. Consequently, two different scenarios for an acceleration of the absorption degradation are derived.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2014/$25.00 © 2014 SPIE
Christian Mühlig and Simon Bublitz "Accelerated lifetime testing of fused silica for deep ultraviolet laser applications revised," Optical Engineering 53(12), 122508 (11 August 2014). https://doi.org/10.1117/1.OE.53.12.122508
Published: 11 August 2014
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KEYWORDS
Absorption

Silica

Deep ultraviolet

Luminescence

Laser applications

Temperature metrology

Annealing

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