Straightforward technique for in situ imaging of spin-coated thin films

Daniel T.  W. Toolan

doi:10.1117/1.OE.54.2.024109

24 February 2015 Straightforward technique for in situ imaging of spin-coated thin films

Daniel T. W. Toolan

Author Affiliations +

Optical Engineering, Vol. 54, Issue 2, 024109 (February 2015). https://doi.org/10.1117/1.OE.54.2.024109

Abstract

Spin-coating provides a facile method for the production of highly uniform thin films that have applications as photoresists, coatings, and in organic electronics. Due to the rapid high-speed nature of spin-coating, obtaining data in situ has proved problematic. Recently, a number of in situ characterization techniques have provided new insights into the processes occurring during spin-coating. This paper demonstrates a straightforward method for obtaining in situ optical reflectance images during spin-coating that provide insights into film thinning dynamics, the origins of surface inhomogeneities caused by contaminated substrates, and crystallization processes. This technique could be easily implemented industrially and in many laboratories and will allow for a better understanding of the spin-coating process.

Citation Download Citation

Daniel T. W. Toolan "Straightforward technique for in situ imaging of spin-coated thin films," Optical Engineering 54(2), 024109 (24 February 2015). https://doi.org/10.1117/1.OE.54.2.024109

Published: 24 February 2015

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