Origin and distribution of redeposition layer in polished fused silica

Zhuo Wang; Lin Wang; Wenqiang Peng; YuJun Cao; JunHong Yang; Li Tang; ShengYi Li

doi:10.1117/1.OE.54.8.085102

7 August 2015 Origin and distribution of redeposition layer in polished fused silica

Zhuo Wang, Lin Wang, Wenqiang Peng, YuJun Cao, JunHong Yang, Li Tang, ShengYi Li

Author Affiliations +

Funded by: National University of Defense Technology, National Natural Science Foundation of China (NSFC), National Natural Science Foundation of China, State Key Laboratory for Conservation Utilization of Subtropical Agro–bioresources

Optical Engineering, Vol. 54, Issue 8, 085102 (August 2015). https://doi.org/10.1117/1.OE.54.8.085102

Abstract

Subsurface damage, especially photoactive impurities embedded in the redeposition layer, degrades the performance of high-energy optics in UV or high-power laser systems. The features and distributions of the redeposition layer in classical and magnetorheological finishing polished fused silica were detected and evaluated by a variety of measurements, such as secondary ion mass spectroanalyzer, atomic force microscope, scanning electron microscope, and x-ray photoelectron spectroscopy. Then, a critical particle Reynolds number approach and chemical contribution were applied to interpret the deposition mechanism of impurities, on the basis of which a comprehensive redeposition model of polished optics was presented. Eventually, the relationship between distributions of redeposition materials in depth and freshly polished surface structure was investigated. Results show that the redeposition process of nanoparticles is dominated with the particle Reynolds number and the formation of a Ce─O─Si bond. The impurities in the redeposition layer are mixed with removed glass and present as a uniform dopant. Furthermore, there exists explicit correlation between redeposition layer and subsurface defected layer; so it is easy to achieve planarized surface in the polishing process.

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Zhuo Wang, Lin Wang, Wenqiang Peng, YuJun Cao, JunHong Yang, Li Tang, and ShengYi Li "Origin and distribution of redeposition layer in polished fused silica," Optical Engineering 54(8), 085102 (7 August 2015). https://doi.org/10.1117/1.OE.54.8.085102

Published: 7 August 2015

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