Mr. Aaron Thurber Profile

Aaron Thurber

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 22 February 2021 Presentation + Paper

High resolution profiles of 3D NAND pillars using x-ray scattering metrology

M. Fan, R. Ranjit, A. Thurber, D. Engelhard

Proceedings Volume 11611, 116110S (2021) https://doi.org/10.1117/12.2585217

KEYWORDS: Semiconducting wafers, Critical dimension metrology, 3D metrology, X-rays, Etching, Diffraction, Scattering, Metrology, Transmission electron microscopy, Scanning electron microscopy

Read Abstract +

High-performance memory production requires discovery of process anomalies that affect device performance. Optical metrology can monitor CDs of device structures, but has limited resolution for 3D NAND, especially towards the bottom of high aspect ratio (HAR) structures. Destructive, offline techniques (e.g., cross-sectional SEM, FIB, TEM) can be used for high resolution HAR profile measurement, but are time consuming, offering little statistical feedback for accurate process control. As an alternative, small angle X-ray scattering (CD-SAXS) can measure 3D HAR structures precisely and non-destructively. CD-SAXS has high sensitivity to 3D profiles, including profiles of CD, ellipticity and tilt through the entirety of the channel hole. CD-SAXS is non-destructive and used inline, providing fast time to results for efficient process characterization. In this paper, we will show data from a CD-SAXS system, including high-resolution CD, ellipticity and tilt profiles, and etch depth of 3D NAND channel holes with strong correlation to reference metrology. With this production-ready CD-SAXS system, flash memory CD profiles can be monitored inline for improved time to an optimized channel etch process.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years