Dr. Aditya Dayal
Senior Applications Engineering Manager at KLA Corp
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Information fusion, Reticles, Calibration, Scanners, Inspection, Scanning electron microscopy, Transistors, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 26 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Data processing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Reticles, Defect detection, Image processing, Inspection, Image resolution, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Reticles, Image processing, Manufacturing, Inspection, Image resolution, Photomasks, Source mask optimization, Semiconducting wafers, Binary data

Showing 5 of 24 publications
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