Dr. Ahmed Gharbi
at CEA-LETI
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Lithography, Nanostructures, Electron beam lithography, Electron beams, Deep ultraviolet, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Nanolithography, 193nm lithography

Proceedings Article | 3 April 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Photomasks, Directed self assembly, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Wet etching, Critical dimension metrology, System on a chip, HF etching, Tin

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Metrology, Optical lithography, Etching, Polymers, Image processing, Materials processing, Manufacturing, Scanning electron microscopy, 3D metrology, Directed self assembly

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Oxides, Optical lithography, Silicon, Materials processing, Photomasks, Directed self assembly, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Showing 5 of 31 publications
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