Ahmed Hamed Fatehy
RET Product Engineers Lead at Siemens EDA
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Ahmed Hamed-Fatehy is currently RET Product Engineers Lead at Mentor Graphics. For the last few years, he has contributed to the development of EDA tools that solve issues related to Multi-Patterning, Resolution Enhancement Techniques, and Integrated Manufacturing Flows. Ahmed received his BSc.and MSc. in Electrical Engineering from Cairo University, Egypt
Publications (7)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Design for manufacturing, Image enhancement, Extreme ultraviolet lithography, Optical proximity correction

Proceedings Article | 21 March 2019 Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Optical lithography, Etching, Manufacturing, Printing, Photomasks, Double patterning technology, Optical proximity correction, SRAF

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Model-based design

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

Showing 5 of 7 publications
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