Mr. Ahmed S. Omran Profile

Ahmed S. Omran

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Publications (9)

Proceedings Article | 23 April 2021 Presentation + Paper

Fast model-driven target optimization methods using machine learnings

Marco Guajardo, Ahmed Omran, Howard Clark

Proceedings Volume 11614, 116140Z (2021) https://doi.org/10.1117/12.2587122

KEYWORDS: Machine learning, Optimization (mathematics), Model-based design, Optical proximity correction, Photomasks, Neural networks, Image segmentation, Convolution

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Proceedings Article | 22 March 2021 Presentation + Paper

Machine learning ILT for memory customers

Thomas Cecil, Kyle Braam, Ahmed Omran, Amyn Poonawala, Jason Shu, Clark Vandam

Proceedings Volume 11613, 116130P (2021) https://doi.org/10.1117/12.2587107

KEYWORDS: Machine learning, Visualization, Optical proximity correction, Neural networks

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Proceedings Article | 23 March 2020 Presentation + Paper

Advanced memory cell design optimization with inverse lithography technology

Jiro Higuchi, Weiting Wang, Takamasa Takaki, Hiromitsu Mashita, Shigeki Nojima, Ahmed Omran, Ken Hanafusa, Seunghee Baek, Ryan Chen, Yukio Asaka, Kyle Braam, Hironobu Taoka, Guangming Xiao

Proceedings Volume 11328, 1132806 (2020) https://doi.org/10.1117/12.2557847

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Bridges, Data analysis, Semiconducting wafers, Resolution enhancement technologies, SRAF

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Proceedings Article | 23 March 2020 Presentation + Paper

Establishing fast, practical, full-chip ILT flows using machine learning

Thomas Cecil, Kyle Braam, Ahmed Omran, Amyn Poonawala, Jason Shu, Clark Vandam

Proceedings Volume 11327, 1132706 (2020) https://doi.org/10.1117/12.2551425

KEYWORDS: Data modeling, Photomasks, Lithography, Machine learning, Optical proximity correction, Convolution, Network architectures, Inverse problems, Calibration

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Proceedings Article | 16 October 2017 Paper

Improved testpatterns and coverage for complex SrAF to optimize 5nm and below OPC and mask patterning

Marco Guajardo, Hesham Abdelghany, Ahmed Omran, Yu Chen, Kevin Lucas

Proceedings Volume 10451, 104511N (2017) https://doi.org/10.1117/12.2280585

KEYWORDS: SRAF, Neural networks, Optical proximity correction, Manufacturing, Neurons, Optical lithography, Machine learning, Data modeling, Control systems

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Proceedings Article | 16 March 2016 Paper

Hybrid pattern matching based SRAF placement

Ahmed Omran, Andrey Lutich, Uwe Paul Schroeder

Proceedings Volume 9781, 978117 (2016) https://doi.org/10.1117/12.2225830

KEYWORDS: SRAF, Logic, Design for manufacturing, Optical proximity correction, Immersion lithography, Model-based design, Performance modeling, Photomasks, Databases, Lithography, Printing, Photovoltaics, Resolution enhancement technologies, Phase modulation

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Proceedings Article | 18 March 2015 Paper

Calibrating etch model with SEM contours

François Weisbuch, A. Omran, Kenneth Jantzen

Proceedings Volume 9426, 94261T (2015) https://doi.org/10.1117/12.2180271

KEYWORDS: Etching, Calibration, Scanning electron microscopy, Data modeling, Optical proximity correction, Performance modeling, Statistical modeling, Lithography, Optical lithography, Semiconducting wafers

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Proceedings Article | 13 March 2012 Paper

Can fast rule-based assist feature generation in random-logic contact layout provide sufficient process window?

Ahmed Omran, George Lippincott, Jochen Schacht, Junjiang Lei, Le Hong, Loran Friedrich, Regina Shen, Ryan Chou

Proceedings Volume 8326, 83261P (2012) https://doi.org/10.1117/12.915787

KEYWORDS: SRAF, Optical proximity correction, Logic, Fiber optic illuminators, Printing, Photomasks, Visualization, Lithography, Manufacturing, Resolution enhancement technologies

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Proceedings Article | 14 October 2011 Paper

Dynamic feedback controller for optical proximity correction

Ahmed Omran, Jochen Schacht, Jully Pan, Junjiang Lei, Le Hong, Mohamed Al-Imam, Nick Cobb, Regina Shen, Ryan Chou

Proceedings Volume 8166, 81663I (2011) https://doi.org/10.1117/12.896677

KEYWORDS: Optical proximity correction, Feedback control, Photomasks, Logic, Visualization, Semiconducting wafers, Diffraction, Lithography, Detection and tracking algorithms, Critical dimension metrology

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Showing 5 of 9 publications

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